Researchers at North Carolina State University have
developed a new technique for creating high-quality semiconductor thin films at
the atomic scale – meaning the films are only one atom thick. The technique can
be used to create these thin films on a large scale, sufficient to coat wafers
that are two inches wide, or larger.
“This could be used to scale current semiconductor
technologies down to the atomic scale – lasers, light-emitting diodes (LEDs),
computer chips, anything,” says Dr. Linyou Cao, an assistant professor of
materials science and engineering at NC State and senior author of a paper on
the work. “People have been talking about this concept for a long time, but it
wasn’t possible. With this discovery, I think it’s possible.”